接触角
聚四氟乙烯
材料科学
X射线光电子能谱
氟碳化合物
图层(电子)
杂质
等离子体
蚀刻(微加工)
等离子清洗
基质(水族馆)
纳米结构
化学工程
等离子体刻蚀
复合材料
纳米技术
化学
有机化学
工程类
地质学
物理
海洋学
量子力学
作者
Vivek Pachchigar,Umesh Gaur,T. V. Amrutha,K.P. Sooraj,Sukriti Hans,S. K. Srivastava,Mukesh Ranjan
标识
DOI:10.1002/ppap.202200037
摘要
Abstract Production of superhydrophobic polytetrafluoroethylene (PTFE) by Ar plasma etching is challenging as it leads to defluorination, resulting in a hydrophilic surface. The effect of radiofrequency power, treatment time, impurity, and surface temperature on Ar plasma‐treated PTFE was investigated for producing a large‐area superhydrophobic PTFE surface. To avoid impurity and substrate temperature effects, a single electrode‐based arrangement with a sacrificial PTFE disc behind the specimen was used for plasma discharge. After 5 min treatment at 100 W, the surface became superhydrophobic (water contact angle = 156°) due to the formation of isotropic nanostructures. However, 30 min of plasma treatment caused severe chemical changes resulting in a hydrophilic surface (water contact angle = 14°). A yellowish layer was formed on the surface due to crosslinking, redeposition of fluorocarbon species, and iron impurities from the plasma system confirmed by X‐ray photoelectron spectroscopy analysis.
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