光子晶体
光子学
材料科学
制作
光电子学
光子集成电路
亚布朗维特
平版印刷术
电子束光刻
激光器
纳米光刻
纳米技术
光学
抵抗
物理
医学
替代医学
病理
图层(电子)
作者
Wei Jiang,Michelle L. Povinelli
出处
期刊:Nanostructure science and technology
日期:2008-01-01
卷期号:: 353-426
被引量:1
标识
DOI:10.1007/978-0-387-76499-3_11
摘要
We review basic physics of photonic crystals, discuss the relevant fabrication techniques, and summarize important device development in the past two decades. First, photonic band structures of photonic crystals and the origin of the photonic band gap are analyzed. Fundamental photonic crystal structures, such as surfaces, slabs, and engineered defects that include cavities and waveguides, are examined. Applications at visible and infrared wavelengths require photonic crystals to have submicron features, sometimes with precision down to the nanoscale. Common fabrication methods that have helped make such exquisite structures will be reviewed. Lastly, we give a concise account of key advances in photonic crystal-based lasers, light-emitting devices, modulators, optical filters, superprism-based demultiplexers and sensors, and negative index materials. Electron-beam nanolithography has enabled major research progress on photonic crystal devices in the last decade, leading to significant reduction of size and/or power dissipation in devices such as lasers and modulators. With deep ultraviolet (DUV) lithography, these devices may one day be manufactured with the prevalent CMOS technology at affordable cost.
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