肖特基二极管
材料科学
光电子学
二极管
肖特基势垒
降级(电信)
稳健性(进化)
宽禁带半导体
金属半导体结
氮化镓
电子工程
纳米技术
图层(电子)
化学
工程类
生物化学
基因
作者
Bhawani Shankar,Sayak Dutta Gupta,Ankit Soni,Srinivasan Raghavan,Mayank Shrivastava
出处
期刊:IEEE Transactions on Device and Materials Reliability
[Institute of Electrical and Electronics Engineers]
日期:2019-05-14
卷期号:19 (2): 437-444
被引量:8
标识
DOI:10.1109/tdmr.2019.2916846
摘要
This experimental study reports behavior of Ni/Au-based AlGaN/GaN Schottky diodes under ESD conditions. A comparative study of diodes with/without recessed Schottky contact unfolds different degradation physics in each case. The impact of different current conduction mechanisms, device degradation and trap generation on its robustness are analyzed. The role of interface traps under ESD failure of the GaN Schottky diode is investigated. The transition from soft-to-hard failure, which is found to depend on the presence of traps, and diode design is discussed. New insights into degradation trends, cumulative nature of degradation, and trap-assisted failure modes are discovered.
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