高功率脉冲磁控溅射
朗缪尔探针
等离子体
等离子体诊断
原子物理学
脉冲(物理)
材料科学
氩
溅射沉积
温度电子
脉冲功率
溅射
化学
分析化学(期刊)
电压
物理
薄膜
纳米技术
量子力学
色谱法
作者
R. Hippler,Martin Čada,Zdeněk Hubička
摘要
High power impulse magnetron sputtering (HiPIMS) of a cobalt cathode in argon gas was investigated by time-resolved electrical (Langmuir) probe diagnostics and by time-integrated energy-resolved mass spectrometry. The HiPIMS discharge was operated with a bipolar pulsed power supply, providing a large negative voltage with a typical pulse width of 100 μs followed by a long positive pulse with a pulse width of about 310 μs. The time-resolved Langmuir probe results yield a small negative plasma potential in the negative pulse regime and a large positive floating potential and plasma potential in the positive pulse regime. The electron density is significantly reduced during the positive pulse regime. The probe results are supported by ion energy measurements.
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