材料科学
压电
锆钛酸铅
压电系数
复合材料
制作
异质结
溅射
退火(玻璃)
铁电性
微电子机械系统
图层(电子)
薄膜
光电子学
纳米技术
电介质
医学
病理
替代医学
作者
Yingying Wang,Jun Ouyang,Hongbo Cheng,Yushu Shi,Takumi Nishikado,Isaku Kanno
摘要
Integration of high-performance lead zirconate titanate (PZT) piezoelectric films onto (111) Si substrates is beneficial for the development of piezoelectric micro-electro-mechanical systems (Piezo-MEMS) because of (111) Si's isotropic mechanical properties and desirable etching characteristics. These features will greatly reduce complications in micro-device fabrication and patterning of PZT/Si heterostructures. However, piezoelectric performance of a PZT film is usually dominated by its preferred crystalline orientation, with (001) being superior than (110) and (111). Such a vectorial dependence seriously restricts applications of PZT films grown on (111) Si, which are usually not (001)-textured. In this work, highly (001)-oriented PZT thick films (∼1.5 μm) with a 53/47 Zr/Ti ratio were prepared on (111) Si substrates via a multi-layer buffering technique, i.e., through the use of a (111)Pt/Ti bi-layer and a LaNiO3 buffer layer. The PZT films were sputter-deposited at a low temperature (350 °C) and then crystallized in a (001) texture via a rapid thermal annealing (RTA). The e31,f transverse piezoelectric coefficient was up to ∼11.6 C/m2 for PZT films with a RTA time of 2 minutes. Such an e31,f value is comparable to that of PZT films grown on (100) Si. This work opens up many possibilities for Piezo-MEMS by demonstrating the desirable combination of a large piezoelectricity in (001) PZT with a good patternability of (111) Si.
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