纳米压印光刻
制作
模具
材料科学
平版印刷术
石英
过程(计算)
纳米技术
光电子学
光学
复合材料
计算机科学
医学
替代医学
病理
操作系统
物理
作者
Kenta Suzuki,Sung-Won Youn,Qing Wang,Hiroshi Hiroshima
标识
DOI:10.7567/jjap.53.06jk01
摘要
In-liquid alignment is expected to be applied to UV nanoimprint lithography (UV-NIL) for the fabrication of integrated circuits that requires high-precision multilayer processes. It is not very easy to perform in-liquid alignment using quartz molds commonly used in UV-NIL, since alignment marks on the molds become invisible owing to the refractive index matching of quartz and UV-curable resin when alignment marks of a mold are filled with UV-curable resin. In this paper, we developed a simple fabrication process for quartz molds without the mentioned problem. We successfully fabricated Ti patterns, which served as high-contrast alignment marks, exclusively in the recess part of the mold mark. We also performed in-liquid alignment process using a mold with the marks and demonstrated less than sub-100-nm alignment accuracy.
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