球差
对比度传递函数
光学
分辨率(逻辑)
透射电子显微镜
镜头(地质)
材料科学
电子显微镜
显微镜
扫描透射电子显微镜
场发射枪
电子断层摄影术
常规透射电子显微镜
高分辨率透射电子显微镜
传输(电信)
电子
物理
计算机科学
电信
人工智能
量子力学
作者
Maximilian Haider,Herald Rose,Stephan Uhlemann,B. Kabius,K. Urban
出处
期刊:Journal of Electron Microscopy
[Oxford University Press]
日期:1998-01-01
卷期号:47 (5): 395-405
被引量:183
标识
DOI:10.1093/oxfordjournals.jmicro.a023610
摘要
A hexapole corrector which compensates for the spherical aberration of the objective lens has been incorporated in a commercial 200 kV transmission electron microscope (TEM) equipped with a field emission gun. The successful correction of the spherical aberration is demonstrated by decreasing the instrumental resolution limit from 0.24 nm down to about 0.13 nm. Images of Si-SiCO2 interfaces obtained with the corrected TEM show a remarkable suppression of artefacts and a strong increase in contrast apart from the improved resolution. The design, alignment and the performance of the corrected instrument are outlined in detail.
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