Manipulating Berry curvature of SrRuO3thin films via epitaxial strain

薄膜 外延 应变工程 曲率 脉冲激光沉积 基质(水族馆) 单层 结晶学 拉伤 各向异性 微晶 复合材料
作者
Di Tian,Zhiwei Liu,Shengchun Shen,Zhuolu Li,Yu Zhou,Hongquan Liu,Hanghui Chen,Pu Yu
出处
期刊:Proceedings of the National Academy of Sciences of the United States of America [National Academy of Sciences]
卷期号:118 (18) 被引量:36
标识
DOI:10.1073/pnas.2101946118
摘要

Berry curvature plays a crucial role in exotic electronic states of quantum materials, such as the intrinsic anomalous Hall effect. As Berry curvature is highly sensitive to subtle changes of electronic band structures, it can be finely tuned via external stimulus. Here, we demonstrate in SrRuO3 thin films that both the magnitude and sign of anomalous Hall resistivity can be effectively controlled with epitaxial strain. Our first-principles calculations reveal that epitaxial strain induces an additional crystal field splitting and changes the order of Ru d orbital energies, which alters the Berry curvature and leads to the sign and magnitude change of anomalous Hall conductivity. Furthermore, we show that the rotation of the Ru magnetic moment in real space of a tensile-strained sample can result in an exotic nonmonotonic change of anomalous Hall resistivity with the sweeping of magnetic field, resembling the topological Hall effect observed in noncoplanar spin systems. These findings not only deepen our understanding of anomalous Hall effect in SrRuO3 systems but also provide an effective tuning knob to manipulate Berry curvature and related physical properties in a wide range of quantum materials.
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