分子内力
高分子
分子间力
位阻效应
分子动力学
化学物理
量子
分子
化学
量子化学
反应性(心理学)
计算化学
纳米技术
材料科学
拓扑(电路)
超分子化学
物理
立体化学
有机化学
量子力学
数学
医学
生物化学
替代医学
病理
组合数学
作者
Fred Pashley‐Johnson,Rangika Munaweera,Sheikh I. Hossain,Steven C. Gauci,Laura Delafresnaye,Hendrik Frisch,Megan L. O’Mara,Filip Du Prez,Christopher Barner‐Kowollik
标识
DOI:10.1038/s41467-024-50366-1
摘要
Abstract Understanding the intricate relationship between molecular architecture and function underpins most challenges at the forefront of chemical innovation. Bond-forming reactions are particularly influenced by the topology of a chemical structure, both on small molecule scale and in larger macromolecular frameworks. Herein, we elucidate the impact that molecular architecture has on the photo-induced cyclisations of a series of monodisperse macromolecules with defined spacers between photodimerisable moieties, and examine the relationship between propensity for intramolecular cyclisation and intermolecular network formation. We demonstrate a goldilocks zone of maximum reactivity between the sterically hindered and entropically limited regimes with a quantum yield of intramolecular cyclisation that is nearly an order of magnitude higher than the lowest value. As a result of the molecular design of trifunctional macromolecules, their quantum yields can be deconvoluted into the formation of two different cyclic isomers, as rationalised with molecular dynamics simulations. Critically, we visualise our solution-based studies with light-based additive manufacturing. We formulate four photoresists for microprinting, revealing that the precise positioning of functional groups is critical for resist performance, with lower intramolecular quantum yields leading to higher-quality printing in most cases.
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