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Low-temperature deposition of Al-rich α-(Al, Cr)2O3 films by sputtering AlxCr95-x(α-Al2O3)5 targets
2个月前
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Formation of pure anatase TiO2 using the reactive pulsed dc magnetron sputtering method for controlling the target poisoning state
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7个月前
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Tuning the characteristics of Al2O3 thin films using different pulse configurations: Mid-frequency, high-power impulse magnetron sputtering, and their combination
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Energy-enhanced deposition of copper thin films by bipolar high power impulse magnetron sputtering
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Overcoming the insulating materials limitation in HiPIMS: Ion-assisted deposition of DLC coatings using bipolar HiPIMS
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8个月前
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