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thremo
Lv4
530 积分
2021-01-20 加入
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Recent Advances in Plasma Etching for Micro and Nano Fabrications of Silicon-based Materials: A Review
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Asynchronously Pulsed Plasma for High Aspect Ratio Nanoscale Si Trench Etch Process
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Highly selective dry etching of polystyrene-poly(methyl methacrylate) block copolymer by gas pulsing carbon monoxide-based plasmas
11个月前
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速度真快,点赞
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