Lv3
292 积分 2022-04-20 加入
Ar+ ion beam machining of the carbon thin layer deposited on the Zerodur® substrate for EUVL projection optics
1天前
已完结
Low Energy Xe+ Ion Beam Machining of the Ultralow Expansion Glass Substrates for Aspherical Extreme Ultraviolet Lithography Projection Optics
1天前
已完结
Substrate calibration method of a computer-generated hologram based on ray propagation in a three-dimensional model
3天前
已完结
Stitching interferometry for long X-ray mirrors with lateral multi-shift-based absolute calibration
1个月前
已完结
A hyperelastic hydrogel with an ultralarge reversible biaxial strain
1个月前
已完结
Fabrication of aspherical mirrors for HiNA (high numerical aperture EUV exposure tool) set-3 projection optics
4个月前
已完结
Extreme ultraviolet lithography
4个月前
已完结
Spherical interferometry for the characterization of precision spheres
5个月前
已完结
Optical simulation of the new PTB sphere interferomete
5个月前
已完结
Update on the SEMATECH 0.5 NA Extreme-Ultraviolet Lithography (EUVL) Microfield Exposure Tool (MET)
6个月前
已完结
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