Lv5
1240 积分 2024-02-19 加入
Characteristics of carbon-containing low-k dielectric SiCN thin films deposited via remote plasma atomic layer deposition
1个月前
已完结
Inhibitor-Free Area-Selective Deposition of Titanium Nitride
2个月前
已完结
Study on thickness uniformity of Ta2O5 film evaporated on the inner-face of a hemispherical substrate
6个月前
已完结
Ellipsometry study on silicon nitride film with uneven thickness distribution by plasma-enhanced chemical vapor deposition
6个月前
已完结
Atomic layer epitaxy of twinned TiN by hydrogen-manipulated tailoring on monolayer
8个月前
已完结
Atomic layer epitaxy of twinned TiN by hydrogen-manipulated tailoring on monolayer
8个月前
已完结
Amorphous Si–B–C–N coatings for high-temperature oxidation protection of the γ-TiAl alloy
9个月前
已完结
Maximum Achievable N Content in Atom-by-Atom Growth of Amorphous Si-B-C-N Materials
9个月前
已完结
Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
9个月前
已完结
Modulation of Structural, Electronic, and Optical Properties of Titanium Nitride Thin Films by Regulated In Situ Oxidation
9个月前
已完结
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