Lv12
40 积分 2025-04-15 加入
Effects of process parameters and chamber structure on plasma uniformity in a large-area capacitively coupled discharge
10小时前
已完结
Simulation and optimization of reactor airflow and magnetic field for enhanced thin film uniformity in physical vapor deposition
10小时前
待确认
Simulation and optimization of reactor airflow and magnetic field for enhanced thin film uniformity in physical vapor deposition
19小时前
待确认
Effect of coil and chamber structure on plasma radial uniformity in radio frequency inductively coupled plasma
19小时前
已完结
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