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Properties of Silicon Dioxide Film Deposited By PECVD at Low Temperature/Pressure
3天前
求助中
Investigation for the structural stress of SiO2 thin films and its distribution on the large-wafer created by plasma enhanced chemical vapor deposition
3天前
已完结
Effect of humidity on the residual stress in silicon-containing plasma polymeric coatings
3天前
已完结
Strain investigation of PECVD passivation layer for ferroelectric domain wall random access memory
3天前
已完结
Application of dual-layer polysilicon deposited by PECVD in n-type TOPCon solar cells
3天前
已完结
Properties of Al-SiO2-SiC(3C) Structures with Thermally Grown and PECVD Deposited SiO2 Layers
4天前
已完结
Effect of PECVD Gate SiO2 Thickness on the Poly-Si/SiO2 Interface in Low-Temperature Polycrystalline Silicon TFTs
4天前
已完结
Thermal annealing effects on the stress stability in silicon dioxide films grown by plasma-enhanced chemical vapor deposition
4天前
已完结
Formation of High-Quality SiO2 and SiO2/Si Interface by Thermal-Plasma-Jet-Induced Millisecond Annealing and Postmetallization Annealing
4天前
已完结
Stress development in plasma-deposited silicon dioxide thin-films due to hydrogen evolution
4天前
已完结
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