灵敏度(控制系统)
材料科学
剂量率
退火(玻璃)
辐照
光电子学
电子线路
费米能级
电子工程
化学
物理
放射化学
电气工程
核物理学
电子
工程类
复合材料
作者
В.С. Першенков,Vladislav A. Felitsyn,Alexander S. Bakerenkov,A S Rodin,V. A. Telets,V.V. Belyakov,I. D. Kovsharov,A. I. Zhukov
标识
DOI:10.1109/miel52794.2021.9569132
摘要
A possible influence of location of the effective Fermi level in the forbidden gap of the surface base region on dose rate sensitivity of bipolar integrated circuits was described. Also, it is shown, that the position of the effective Fermi level leads to different behavior of bipolar devices during post-irradiation annealing at enhanced temperature. Experimental tests on dose rate sensitive devices were provided and discussed.
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