欧姆接触
材料科学
光电子学
氧化铟锡
发光二极管
图层(电子)
干法蚀刻
宽禁带半导体
氮化物
铟
氮化镓
蚀刻(微加工)
二极管
铟镓氮化物
纳米技术
作者
Shyi‐Ming Pan,R. C. Tu,Yu-Mei Fan,Ruey-Chyn Yeh,Jung-Tsung Hsu
出处
期刊:IEEE Photonics Technology Letters
[Institute of Electrical and Electronics Engineers]
日期:2003-05-01
卷期号:15 (5): 649-651
被引量:83
标识
DOI:10.1109/lpt.2003.809985
摘要
Presents a surface-textured indium-tin-oxide (ITO) transparent ohmic contact layer on p-GaN to increase the optical output of nitride-based light-emitting diodes (LED) without destroying the p-GaN. The surface-textured ITO layer was prepared by lithography and dry etching, and dimensions of the regular pattern were approximately 3 × 3 μm. The operating voltage of the surface-textured LED was almost the same as that of the typical planar LED since the ITO layer was in ohmic contact with the p-GaN. The experimental results indicate that the surface-textured ITO layer is suitable for fabricating high-brightness GaN-based light emitting devices.
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