Influence of point defects on phase transformation and optical properties of TiO2 thin films via multilayering deposition technique

Thin anatase TiO2 films with preferential (004) orientation were successfully fabricated via multilayering technique, growth and stop repeatedly, using DC-magnetron sputtering and annealed at a relatively low temperature. The multilayering deposition technique suppressed the number of oxygen vacancy defects in TiO2 films without interrupting the columnar growth. The main columnar structure oriented along (101) plane and along (004) plane. Confirmed by the texture coefficient, the preferential (004) orientation of TiO2 films increased with increasing number of compact layers and the highest value was observed for post-annealed films at 200 °C. The surface morphology analysis indicated that the increase of surface roughness with increasing number of compact layers was related to the promotion of crystallization. The optical properties of multilayer films revealed that high number of compact layers greatly enhanced their absorption in the entire visible region, expanded energy band gap and increased refractive index.