光引发剂
光刻胶
材料科学
纳米技术
3D打印
共价键
聚合物
复合材料
化学
有机化学
单体
图层(电子)
作者
Steven C. Gauci,Aleksandra Vranić,Eva Blasco,Stefan Bräse,Martin Wegener,Christopher Barner‐Kowollik
标识
DOI:10.1002/adma.202306468
摘要
Abstract 3D printing with light is enabled by the photochemistry underpinning it. Without fine control over our ability to photochemically gate covalent bond formation by the light at a certain wavelength and intensity, advanced photoresists with functions spanning from on‐demand degradability, adaptability, rapid printing speeds and tailored functionality are impossible to design. Herein, we critically assess recent advances in photoresist design for light‐driven 3D printing applications and provide an outlook of the outstanding challenges and opportunities. We achieve this by classing the discussed photoresists in chemistries that function photoinitiator‐free and those that require a photoinitiator to proceed. Such a taxonomy is based on the efficiency with which photons are able to generate covalent bonds, with each concept featuring distinct advantages and drawbacks. This article is protected by copyright. All rights reserved
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