螺旋钻
俄歇电子能谱
惰性气体
谱线
原子物理学
分析化学(期刊)
化学
俄歇效应
Atom(片上系统)
能量(信号处理)
材料科学
物理
核物理学
色谱法
计算机科学
量子力学
嵌入式系统
有机化学
天文
作者
Peter J. Paterson,Paul H. Holloway,Y. E. Strausser
出处
期刊:Applications of Surface Science
[Elsevier]
日期:1980-01-01
卷期号:4 (1): 37-50
被引量:10
标识
DOI:10.1016/0378-5963(80)90005-7
摘要
Abstract The use of implanted, inert-gas-atom Auger peaks for energy referencing on charging substrates has been investigated. Ar implanted into Cu, Au, BeO, Al 2 O 3 , SiO 2 and Si 3 N 4 was studied along with Xe implanted into Cu, Au and Si 3 N 4 . A linear relationship was always found for plots of the energy of an Auger peak from any sample versus the energy of the Ar or Xe Auger peaks. However, in some cases, the slope of such plots deviated significantly from unity. A slope within ± 5% of unity was observed in 15 out of 19 plots. Thus for an energy shift due to charging of 20 eV, the energy of Auger peaks can generally be fixed to ± 1 eV using this technique.
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