纳米压印光刻
材料科学
偏振器
制作
蚀刻(微加工)
纳米光刻
光电子学
下一代光刻
消光比
平版印刷术
栅栏
基质(水族馆)
抵抗
光学
电子束光刻
波长
纳米技术
图层(电子)
替代医学
医学
病理
地质学
双折射
海洋学
物理
作者
Seh‐Won Ahn,Ki-Dong Lee,Jin‐Sung Kim,Sang Hoon Kim,Joo-Do Park,Sarng-Hoon Lee,Phil-Won Yoon
出处
期刊:Nanotechnology
[IOP Publishing]
日期:2005-07-22
卷期号:16 (9): 1874-1877
被引量:296
标识
DOI:10.1088/0957-4484/16/9/076
摘要
We report the fabrication of a 50 nm half-pitch wire grid polarizer with high performance using nanoimprint lithography. The device is a form of aluminium gratings on a glass substrate whose size of 5.5 cm × 5.5 cm is compatible with a microdisplay panel. A stamp with a pitch of 100 nm was fabricated on a silicon substrate using laser interference lithography and sidewall patterning. The imprint and the aluminium etching processes are optimized to realize uniform aluminium gratings with aspect ratio of 4. The polarization extinction ratio of the fabricated device is over 2000, with transmission of 85% at a wavelength of 450 nm, which is the highest value ever reported. This work demonstrates that nanoimprint lithography is a unique cost-effective solution for nanopatterning requirements in consumer electronics components.
科研通智能强力驱动
Strongly Powered by AbleSci AI