材料科学
兴奋剂
赤铁矿
退火(玻璃)
化学工程
薄膜
纳米技术
光电子学
复合材料
冶金
工程类
作者
Jian Wang,Jianying Yang,Zengyao Zheng,Tong‐Bu Lu,Wenhua Gao
标识
DOI:10.1016/j.apcatb.2017.06.042
摘要
Ti doped hematite (α-Fe2O3) usually shows poor photoactivity compared with pristine Fe2O3 at less positive potential. Herein, a thin and relatively homogeneous nickle-hydroxyl-phosphate (NiPi) film was modified on Ti doped Fe2O3 electrode by a new deposit-photoelectrochemical (DPEC) regulation process for promoting hole transport at low bias. The role of Ti doping and NiPi or CoPi coating was studied by photoelectrochemical and electrochemical measurements in detail, in which NiPi coating suppressed the surface states, while CoPi coating couldn't, Ti doped Fe2O3 possessed relatively rich oxygen vacancies after high temperature annealing, Ti doping only improved carrier density. Desirably, the performance of NiPi was comparable with CoPi. Additional test preliminarily verified that methanol was probably an more effective hole scavenger, while PO43− adsorbed Fe2O3/NiPi suppressed the oxidation of low-concentration glucose, resulting into high-energy glucose waste.
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