作者
Naonori Ishihara,Y. Shimada,T. Ochi,S. Seto,Hiroshi Matsuo,H. Yamashita,Satoshi Morita,Masayuki Ukishima,K. Uejima,Y. Arayashiki,Shoichi Kajiwara,A. Murayama,K. Nishiyama,Kikuko Sugimae,Shunsuke Mori,Yuji Saito,Takeshi Shundo,Atsutaka Maeda,H. Kamiya,Yohji Uchiyama,M. Fujiwara,Fumiki Aiso,Ken‐Taro Sekine,Norio Ohtani
摘要
State-of-the-art Metal Induced Lateral Crystallization (MILC) techniques have been demonstrated for 3D flash memory with ultra-high (over 300) layers. For the first time, 14$-\mu$m-long macaroni silicon (Si) channels in vertical memory hole are fully single-crystallized. Furthermore, by using newly developed nickel (Ni) gettering technique, the 112 word-line-layer 3D flash memory exhibits cell array performances such as read noise reduction of 40% or more, and 10-times channel conductance without any degradations of cell reliability.