原子层沉积
原子单位
可控性
现状
纳米技术
图层(电子)
材料科学
计算机科学
物理
数学
量子力学
应用数学
经济
市场经济
作者
Xinwei Wang,Rong Chen,Shuhui Sun
标识
DOI:10.1088/2631-7990/acf3b8
摘要
Highlights Atomic layer deposition (ALD) can offer many unique properties to achieve atomic-scale material manufacturing controllability. The need of ALD for accurate material manufacturing is addressed. The keys to achieve good ALD are summarized. The status quo and future challenges of the ALD technology are presented.
科研通智能强力驱动
Strongly Powered by AbleSci AI