栅栏
材料科学
折射率
电介质
光子学
光电子学
条状物
光学
氧化铟锡
二氧化硅
衍射效率
波长
衍射
拓扑(电路)
薄膜
纳米技术
物理
复合材料
数学
组合数学
冶金
作者
Harry Miyosi Silalahi,Yu‐Chih Chiang,Shih‐Hung Lin,Yan‐Rong Jiang,Chia‐Yi Huang
标识
DOI:10.1002/lpor.202300659
摘要
Abstract This work proposes a quick measurement of the refractive index of dielectric nanofilm via a fabricated topological grating that comprises indium tin oxide (ITO) strips and nanowalls with an extremely high aspect ratio of 25. As the topological grating is capped with a dielectric nanofilm, the parabolic fields of the nanowalls destructively interfere with those of the ITO strips. This destructive interference weakens the photonic jets of the topological grating, decreasing its diffraction efficiency. The decrease in the diffraction efficiency determines the refractive index of the nanofilm without measuring its thickness in advance because the efficiency decrease is independent of the thickness. In other words, the photonic jets of the topological grating are manipulated by the refractive index of the nanofilm. The experimental results verify that refractive indices of titanium‐dioxide, silicon‐dioxide, and bovine‐serum‐albumin nanofilms with a thickness much smaller than the visible wavelengths can be measured by using the proposed topological grating. Therefore, topological gratings have great potential to develop advanced materials, fascinating devices, and innovative instruments.
科研通智能强力驱动
Strongly Powered by AbleSci AI