碳化硅
氮化镓
材料科学
工程物理
宽禁带半导体
功率半导体器件
欧姆接触
光电子学
背景(考古学)
半导体
二极管
数码产品
电力电子
纳米技术
电气工程
电压
工程类
冶金
生物
古生物学
图层(电子)
作者
Fabrizio Roccaforte,Patrick Fiorenza,Giuseppe Greco,Raffaella Lo Nigro,Filippo Giannazzo,Ferdinando Iucolano,Mario Saggio
标识
DOI:10.1016/j.mee.2017.11.021
摘要
Among the wide band gap (WBG) semiconductors, silicon carbide (4H-SiC) and gallium nitride (GaN) are nowadays recognized as outstanding materials for the future of power electronics. In fact, owing to their excellent properties, they can guarantee a better energy efficiency in power conversion systems with respect to Silicon. Today, although several SiC and GaN devices have already reached the market, there are still many technological issues to be faced in order to fully exploit the enormous potential of these materials. In this context, this paper aims to review some emerging trends in the processing of WBG semiconductor devices (e.g., diodes, MOSFETs, HEMTs, …). The focus will be put on some selected “hot topics”, like the channel mobility in SiC MOSFETs, the Ohmic contacts to SiC devices, and the approaches for normally-off GaN HEMTs. Finally, a summary of the open issues and a short outlook on the future perspectives of SiC ultra-high-voltage devices and vertical GaN devices will be given.
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