微尺度化学
无损检测
材料科学
超材料
纳米技术
对偶(语法数字)
计算机科学
光电子学
物理
艺术
数学教育
数学
文学类
量子力学
作者
Brian Blankenship,Timon Meier,Sophia Arvin,Jingang Li,Nathan Seymour,Natalia de la Torre,Brian Hsu,Naichen Zhao,Stefanos Mavrikos,Runxuan Li,Costas P. Grigoropoulos
标识
DOI:10.1021/acsaenm.4c00160
摘要
Defects in microarchitected materials exhibit a dual nature, capable of both unlocking innovative functionalities and degrading their performance. Specifically, while intentional defects are strategically introduced to customize and enhance mechanical responses, inadvertent defects stemming from manufacturing errors can disrupt the symmetries and intricate interactions within these materials. In this study, we demonstrate a nondestructive optical imaging technique that can precisely locate defects inside microscale metamaterials, as well as provide detailed insights on the specific type of defect.
科研通智能强力驱动
Strongly Powered by AbleSci AI