Hydroxyl Radical Based Photocatalytic Degradation of Halogenated Organic Contaminants and Paraffin on Silica Gel

光催化 光降解 化学 羟基自由基 吸附 光化学 硅胶 羟基化 十溴二苯醚 光解 辐照 降级(电信) 激进的 催化作用 有机化学 阻燃剂 物理 核物理学 电信 计算机科学
作者
Ruijuan Qu,Chenguang Li,Jiaoqin Liu,Ruiyang Xiao,Xiaoxue Pan,Xiaolan Zeng,Zunyao Wang,Jichun Wu
出处
期刊:Environmental Science & Technology [American Chemical Society]
卷期号:52 (13): 7220-7229 被引量:188
标识
DOI:10.1021/acs.est.8b00499
摘要

Photochemical materials are of scientific and practical importance in the field of photocatalysis. In this study, the photochemistry of several organic contaminants, including decabromodiphenyl ether (BDE-209), halogenated phenols (C6X5OH, X = F, Cl, Br) and paraffin, on silica gel (SG) surface was investigated under simulated solar irradiation conditions. Photolysis of these compounds at the solid/air interface proceeds with different rates yielding various hydroxylation products, and hydroxyl radical was determined as the major reactive species. According to density functional theory (DFT) calculations, the reaction of physically adsorbed water with reactive silanone sites (>Si═O) on silica was indispensable for the generation of •OH radical, where the required energy matches well with the irradiation energy of visible light. Then, the BDE-209 was selected as a representative compound to evaluate the photocatalytic performance of SG under different conditions. The SG material showed good stability in the photodegradation process, and was able to effectively eliminate BDE-209 under natural sunlight. These findings provide new insights into the potential application of SG as a solid surface photocatalyst for contaminants removal.
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