CMOS芯片
晶体管
材料科学
薄脆饼
生产线后端
集成电路
光电子学
电气工程
环形振荡器
纳米技术
工程类
电压
电介质
作者
Chao-Ching Cheng,Lain‐Jong Li,H.‐S. Philip Wong,Chun‐Chieh Lu,Tsu-Ang Chao,Ang‐Sheng Chou,Hung-Li Chiang,Tzu-Chiang Chen,Tianqi Gao,Jianwen Zhao,Zheng Cui
标识
DOI:10.1109/iedm19573.2019.8993593
摘要
High performance carbon nanotube (CNT) network transistors with on-resistance (R on ) of <; 250 Ω are successfully integrated as back-end-of-the-line (BEOL) power gating devices onto Si CMOS wafers manufactured using 28-nm process technology. When the power supply is connected through the BEOL CNT network header array, the front-end-of-the-line (FEOL) Si ring oscillators (ROs) achieve a similar quiescent current (I DDQ ) and have the comparable active power (P ACTIVE ) consumption under the same operation frequency as compared to the operation without the power gating CNT transistors. The fabrication of CNT devices in the BEOL is verified to cause no performance degradation in the underlying FEOL Si CMOS devices. This study has successfully demonstrated heterogeneous integration of advanced Si logic circuits with low-cost and high-mobility CNT transistors in the BEOL fabricated at low, BEOL-compatible temperatures (250 °C).
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