俄歇电子能谱
X射线光电子能谱
钼
铬
材料科学
氧化物
分析化学(期刊)
氧化铁
合金
薄膜
金属
化学
冶金
化学工程
物理
纳米技术
核物理学
色谱法
工程类
标识
DOI:10.1016/0010-938x(86)90022-3
摘要
AES depth profiling and XPS have been used for the characterization of thin oxide layers thermally grown in situ in the UHV-analysis chamber on pure iron, chromium and the alloys Fe24Cr and Fe24Cr11Mo at a temperature of 384°C. The apparent oxide film thickness and the film composition were monitored as a function of oxygen exposure. The oxidation rate of the Fe24Cr alloy was found to lie in between that of pure iron and chromium. The films formed have a duplex structure, the outer part being iron oxide, the inner part mostly chromium oxide. Alloying with molybdenum decreases the rate of oxidation by a mechanism involving the formation of a barrier layer rich in molybdenum at the oxide-metal interface. No molybdenum is found in the outer part of the oxide film.
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