Reducing Luminescence Intensity and Suppressing Irradiation‐induced Darkening of Bi4Ge3O12 by Ce‐doping for Radiation Detection

放射发光 闪烁体 硅光电倍增管 辐照 材料科学 发光 兴奋剂 闪烁 光电子学 抗辐射性 辐射 荧光粉 离子 光学 物理 探测器 核物理学 量子力学
作者
Yangmin Tang,Mingxue Deng,Qiunan Liu,Chengbin Kang,Xiang Li,Jiaqian Zheng,Kazu Suenaga,Zhenzhen Zhou,Junfeng Chen,Jiacheng Wang,Qian Liu
出处
期刊:Advanced Optical Materials [Wiley]
卷期号:12 (2) 被引量:6
标识
DOI:10.1002/adom.202301332
摘要

Abstract Due to its short radiation length, moderate light output (8000‐9000 photons/MeV), high density (7.13 g cm −3 ), and non‐hygroscopicity, etc., Bi 4 Ge 3 O 12 (BGO) material has been widely utilized as an advanced scintillator for irradiation detection. However, pure BGO cannot meet the requirements for future physics experiments and state‐of‐art industrial facilities coupled with a silicon photomultiplier (SiPM) due to its slow response time, poor radiation resistance, and excessive light output. Herein, a Ce‐doping strategy is reported for efficiently improving the overall performance (e.g., irradiation resistance, decay time, radioluminescence, and light output) of BGO that can be expectedly applied in future high energy physics detection. Ce‐doped BGO (BGO:Ce) displays higher radiation resistance ability under 10 h UV irradiation (97% of original) and a faster fluorescence lifetime (269 ns), superior to pure BGO. Furthermore, BGO:Ce shows ≈30% luminescence intensity of pure BGO, well eliminating the oversaturation of SiPM coupled with scintillation detectors. Theoretical calculations imply that an intense competition between electron or hole traps and Ce ions (Ce 3+ , Ce 4+ ) can effectively reduce the concentration of color centers, thus enhancing irradiation resistance ability.
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