材料科学
薄膜
等离子体
沉积(地质)
核工程
化学气相沉积
立方氧化锆
纳米技术
工程物理
工程类
冶金
陶瓷
物理
核物理学
生物
古生物学
沉积物
作者
Aaron Christopher. Hall,James F. McCloskey,David Anthony Urrea,T.J. Roemer,D.E. Beatty,N. Spinhirne,Deidre A. Hirschfeld
出处
期刊:Thermal spray
日期:2009-05-04
卷期号:83690: 725-728
被引量:2
标识
DOI:10.31399/asm.cp.itsc2009p0725
摘要
Abstract This paper describes the basic design and operation of a low-pressure plasma spraying (LPPS) system in use at Sandia National Laboratories. To demonstrate the versatility of the system, Sandia engineers, working in collaboration with the New Mexico Institute of Mining and Technology, produced thin (< 100 μm), dense yttria-stabilized zirconia coatings using three deposition mechanisms: liquid droplet, vapor, and mixed mode (vapor and droplet). Despite slight differences in equipment configuration, the work duplicates many of the results obtained in previous investigations, confirming the advantages of LPPS over other thin film deposition techniques.
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