材料科学
氧化镍
钙钛矿(结构)
图层(电子)
化学工程
光电子学
薄膜
能量转换效率
镍
非阻塞I/O
氧化物
纳米技术
催化作用
冶金
化学
有机化学
工程类
作者
Ziye Liu,Jingjing Chang,Zhenhua Lin,Long Zhou,Junqing Yan,Weidong Zhu,Chunfu Zhang,Shengzhong Liu,Yue Hao
标识
DOI:10.1002/aenm.201703432
摘要
Abstract NiO x hole transporting layer has been extensively studied in optoelectronic devices. In this paper, the low temperature, solution–combustion‐based method is employed to prepare the NiO x hole transporting layer. The resulting NiO x thin films show better quality and preferable energy alignment with perovskite thin film compared to high temperature sol–gel‐processed NiO x . With this, high‐performance perovskite solar cells are fabricated successfully with power conversion efficiency exceeding 20% using a modified two‐step prepared MA 1− y FA y PbI 3− x Cl x perovskite. This efficiency value is among the highest values for NiO x ‐based devices. Various characterizations and analyses provide evidence of better film quality, enhanced charge transport and extraction, and suppressed charge recombination. Meanwhile, the device exhibits much better device stability compared to sol–gel‐processed NiO x and poly(3,4‐ethylenedioxythiophene):poly(styrenesulfonate)‐based devices.
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