电镀(地质)
硅
材料科学
等效串联电阻
丝网印刷
光电子学
导电体
电镀效率
金属
电气工程
化学
冶金
复合材料
工程类
物理
电压
地球物理学
生物化学
体外
作者
A. Mette,C. Schetter,D. Wissen,S. Lust,Stefan W. Glunz,G. Willeke
标识
DOI:10.1109/wcpec.2006.279322
摘要
This paper presents a method to improve the efficiency of large area screen-printed silicon solar cells by about 0.3% to 0.4% absolute. By light-induced plating (LIP) the series resistance of screen-printed solar cells is reduced. The line conductivity of the front side metal conductors is improved without increasing the shaded area. This plating technique has been optimized for years at Fraunhofer ISE and is a fast method to homogeneously galvanize metal contacts on n-doped material. High efficiencies of 18.4% on 20times20 mm 2 screen-printed FZ silicon solar cells and 16.6% on 156times156 mm 2 industrial processed mc-Si solar cells have been obtained. It is believed that the significant increase of efficiency combined with the reduction of the amount of screen-printing paste required, overcompensates the cost for this additional step at the end of the process sequence
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