Simple method for measuring acid generation quantum efficiency at 193 nm
简单（哲学）
材料科学
光电子学
量子
作者
Charles R. Szmanda,Robert J. Kavanagh,John F. Bohland,James F. Cameron,Peter Trefonas,Robert F. Blacksmith
出处
期刊：Proceedings of SPIE, the International Society for Optical Engineering日期：1999-06-11卷期号：3678: 857-866被引量：23
标识
DOI：10.1117/12.350274
摘要
Traditional methods of measuring the Dill C Parameter involve monitoring the absorbance of a resist as a function of exposure. In chemically amplified resist, absorbance changes with exposure are small and frequently have little correlation to the amount of photoacid generated.
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