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Formation of disinfection by-products during sodium hypochlorite cleaning of fouled membranes from membrane bioreactors

化学 次氯酸钠 卤乙酸 胞外聚合物 生物膜 二氯乙酸 膜生物反应器 清洁剂 次氯酸盐 流出物 色谱法 外聚物 生物污染 细菌 有机化学 生物化学 废物管理 工程类 生物 遗传学
作者
Hao Wang,Defang Ma,Weiye Shi,Z. Yang,Yun Cai,Baoyu Gao
出处
期刊:Frontiers of Environmental Science & Engineering [Springer Nature]
卷期号:15 (5) 被引量:27
标识
DOI:10.1007/s11783-021-1389-3
摘要

Periodic chemical cleaning with sodium hypochlorite (NaClO) is essential to restore the membrane permeability in a membrane bioreactor (MBR). However, the chlorination of membrane foulants results in the formation of disinfection by-products (DBPs), which will cause the deterioration of the MBR effluent and increase the antibiotic resistance in bacteria in the MBR tank. In this study, the formation of 14 DBPs during chemical cleaning offouled MBR membrane modules was investigated. Together with the effects of biofilm extracellular polymeric substances (EPS), influences of reaction time, NaClO dosage, initial pH, and cleaning temperature on the DBP formation were investigated. Haloacetic acids (HAAs) and trichloromethane (TCM), composed over 90% of the DBPs, were increasingly accumulated as the NaClO cleaning time extended. By increasing the chlorine dosage, temperature, and pH, the yield of TCM and dichloroacetic acid (DCAA) was increased by up to a factor of 1-14, whereas the yields of haloacetonitriles (HANs) and haloketones (HKs) were decreased. Either decreasing in the chlorine dosage and cleaning temperature or adjusting the pH of cleaning reagents toward acidic or alkaline could effectively reduce the toxic risks caused by DBPs. After the EPS extraction pretreatment, the formation of DBPs was accelerated in the first 12 h due to the damage of biofilm structure. Confocal laser scanning microscopy (CLSM) images showed that EPS, particularly polysaccharides, were highly resistant to chlorine and might be able to protect the cells exposed to chlorination.Supplementary material is available in the online version of this article at 10.1007/s11783-021-1389-3 and is accessible for authorized users.
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