数据保留
磁阻随机存取存储器
可靠性(半导体)
计算机科学
电阻随机存取存储器
嵌入式系统
非易失性存储器
过程(计算)
回流焊
电子工程
计算机硬件
电气工程
工程类
印刷电路板
随机存取存储器
电压
功率(物理)
物理
操作系统
量子力学
计算机安全
作者
Yu-Der Chih,Chung-Cheng Chou,Yi-Chun Shih,Chia-Fu Lee,Win-San Khwa,Chun-Yu Wu,Kuei‐Hung Shen,Wen-Ting Chu,Meng‐Fan Chang,Harry Chuang,Tsung-Yung Jonathan Chang
标识
DOI:10.1109/iedm19574.2021.9720557
摘要
Emerging Memory such as STT-MRAM, RRAM and PCRAM, are attractive candidates to replace the conventional flash memory for embedded applications. The key challenges of these new concepts include small read window, large write current, write endurance and data retention. Moreover, the data retention during the process of soldering reflow (260°C/90s), wafer-level chip-scale package (WLCSP, 340°C/3 hours) and the magnetic field interference to STT-MRAM are the additional challenges for these new NVM concepts. To address these challenges, several design solutions based on the technology-design-co-optimization (TDCO) were proposed, including smart write algorithm with process-temperature-location compensation scheme for write, smart trimming of sensing circuits for read, high-retention OTP-like write scheme, etc. By using these TDCO solutions, both STT-MRAM and RRAM have demonstrated an excellent manufacturability with a competitive PPA, reliability and a reliable approach to retain the data during soldering reflow and WLCSP.
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