功率MOSFET
沟槽
栅氧化层
MOSFET
光电子学
浅沟隔离
材料科学
电气工程
晶体管
平面的
击穿电压
功率半导体器件
金属浇口
场效应晶体管
阈值电压
电压
工程类
计算机科学
图层(电子)
纳米技术
计算机图形学(图像)
作者
K. Muthuseenu,Hugh J. Barnaby,K.F. Galloway,A. E. Koziukov,Т. A. Maksimenko,Mikhail Yu. Vyrostkov,K. B. Bu-Khasan,А. А. Калашникова,A. Privat
标识
DOI:10.1109/ted.2021.3091952
摘要
This article presents design for a 650-V super-junction (SJ) power metal–oxide–semiconductor field effect transistor (MOSFET) which improves tolerance to both single-event burnout (SEB) and single-event gate rupture (SEGR). Experimental measurements of SEGR in a generic commercial planar gate SJ device are used to validate the accuracy of the design. In an SJ device with a planar gate, reducing the neck width improves the tolerance to gate rupture but significantly changes the electrical device characteristics. The trench gate SJ device design is shown to overcome this problem. A buffer layer and larger P + -plug are added to the trench gate SJ power transistor to improve SEB tolerance. The proposed trench gate structure improves the SEGR survivability by a factor of 10.
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