辐照
高电子迁移率晶体管
材料科学
电容
光电子学
离子
阈值电压
泄漏(经济)
重离子
氮化镓
电压
电气工程
电极
图层(电子)
晶体管
化学
复合材料
物理
工程类
物理化学
宏观经济学
经济
有机化学
核物理学
作者
Lihao Wang,Yunpeng Jia,Yuanfu Zhao,Liang Wang,Zhonghan Deng
标识
DOI:10.1109/icreed52909.2021.9588747
摘要
In this paper, an experimental characterization of the behavior of commercial 200V/48A Enhancement-mode GaN HEMTs under heavy ion irradiation is presented. The damage caused by SEE may cumulative and permanent, which makes the drain leakage current gradually increase. Regardless of whether SEE occurs, the threshold voltage will shift after heavy ion irradiation. The increase in output capacitance and reverse transfer capacitance means that the AlGaN buffer layer is partially damaged, resulting in an increase in drain leakage current.
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