材料科学
单层
之字形的
半导体
红外线的
紫外线
光电效应
可见光谱
光电子学
直接和间接带隙
拉伸应变
带隙
拉伤
极限抗拉强度
纳米技术
光学
复合材料
内科学
物理
医学
数学
几何学
作者
Qingyuan Chen,Mingyang Liu,Chao Cao,Yao He
出处
期刊:Nanotechnology
[IOP Publishing]
日期:2021-03-01
卷期号:32 (23): 235201-235201
被引量:8
标识
DOI:10.1088/1361-6528/abeada
摘要
We studied the structural, electronic, and optical characters of SiS2, a new type of group IV-VI two-dimensional semiconductor, in this article. We focused on monolayer SiS2and its characteristic changes when different strains are applied on it. Results reveal that the monolayer SiS2is dynamically stable when no strain is applied. In terms of electronic properties, it remains a semiconductor under applied strain within the range from -10% to 10%. Besides, its indirect band-gap is altered regularly after applying a strain, whereas different strains lead to various changing trends. As for its optical properties, it exhibits remarkable transparency for infrared and most visible light. Its main absorption and reflection regions lie in the blue and ultraviolet areas. The applied uniaxial strain causes its different optical properties along the armchair direction and zigzag direction. Moreover, the tensile strain could tune its optical properties more effectively than the compressive strain. When different strains are applied, the major changes are in blue and ultraviolet regions, but only minor changes can be found in infrared and visible regions. So its optical properties reveal good stability in infrared and visible regions. Therefore, SiS2has a promising prospect in nano-electronic and nano-photoelectric devices.
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