制作
材料科学
超材料
等离子体子
红外线的
钼
光电子学
纳米技术
蚀刻(微加工)
工程物理
光学
物理
图层(电子)
病理
冶金
替代医学
医学
作者
Takahiro Yokoyama,Thang Duy Dao,Kai Chen,Satoshi Ishii,Ramu Pasupathi Sugavaneshwar,Masahiro Kitajima,Tadaaki Nagao
标识
DOI:10.1002/adom.201600455
摘要
Plasmonic metamaterials are used for the fabrication of spectrally selective narrow-band mid-infrared thermal emitters operating at high temperatures. Using refractory materials, molybdenum and aluminum oxide in this case, high temperature operation has been demonstrated in vacuum up to 1000 °C. Colloidal mask etching is adopted to realize large-scale and cost-effective fabrication. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
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