作者
Kitae Park,Sang-Wan Nam,Daehan Kim,Pansuk Kwak,Doo-Sub Lee,Yong‐Sang Choi,Minsuk Choi,Donghun Kwak,Doo-Hyun Kim,Minsu Kim,Hyun-Wook Park,Sang-Won Shim,Kyung-Min Kang,Sang‐Won Park,Kangbin Lee,Hyun-Jun Yoon,Kuihan Ko,Dong-Kyo Shim,Y. H. Ahn,Jiseon Ryu,Dong-Hyun Kim,Kyunghwa Yun,Joonsoo Kwon,Sanghoon Shin,Dae-Seok Byeon,Kihwan Choi,Jin-Man Han,Kye-Hyun Kyung,Jung Kyu Choi,Kinam Kim
摘要
In this work, we present a true 3D 128 Gb 2 bit/cell vertical-NAND (V-NAND) Flash product for the first time. The use of barrier-engineered materials and gate all-around structure in the 3D V-NAND cell exhibits advantages over $1 \times$ nm planar NAND, such as small Vth shift due to small cell coupling and narrow natural Vth distribution. Also, a negative counter-pulse scheme realizes a tightly programmed cell distribution. In order to reduce the effect of a large WL coupling, a glitch-canceling discharge scheme and a pre-offset control scheme is implemented. Furthermore, an external high-voltage supply scheme along with the proper protection scheme for a high-voltage failure is used to achieve low power consumption. The chip accomplishes 50 MB/s write throughput with 3 K endurance for typical embedded applications. Also, extended endurance of 35 K is achieved with 36 MB/s of write throughput for data center and enterprise SSD applications.