薄膜晶体管
背板
材料科学
光电子学
对偶(语法数字)
晶体管
产量(工程)
电气工程
纳米技术
工程类
电压
复合材料
文学类
艺术
图层(电子)
作者
Mohammad Masum Billah,Md. Mehedi Hasan,Duk Young Jeong,Jae Gwang Um,Jin Jang
摘要
We studied the effect of a‐IGZO thickness (t IGZO ) on device uniformity and drain current (I D ) of a‐IGZO thin‐film‐transistors (TFTs) driven by the single gate (SG) and dual‐gate driving (DG‐driving). Numerical simulation using fitting density‐of‐states (DOS) exhibits ~5 times larger I D and excellent uniformity with DG‐driving TFTs for a‐IGZO t IGZO <20 nm than SG‐TFT and enables the opportunity of high yield backplanes using DG‐TFTs for next generation high‐performance display applications.
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