插层(化学)
扩散
离子
化学
电化学
无机化学
分析化学(期刊)
热力学
物理化学
电极
物理
有机化学
色谱法
作者
M. Stro mme Mattsson,Gunnar A. Niklasson,C.G. Granqvist
摘要
Fluorinated Ti dioxide films were made by reactive sputtering. The mobility of Li, Na, and K in this host was studied by electrochemical techniques. Chronopotentiometry suggested that the cations occupy one type of site for cation/Ti ratios below 0.5, and that other sites are populated at higher ratios. Li and Na intercalation appeared to progress without major structural changes, whereas the intercalation of the larger K ions caused structural rearrangement. Impedance spectra were interpreted within a Randles circuit with a finite length Warburg element from which chemical diffusion coefficients were obtained at different intercalation levels and temperatures. The ion diffusion could be understood in detail from the classical Anderson–Stuart model [O. L. Anderson and D. A. Stuart, J. Am. Ceram. Soc. 37, 573 (1954)] as long as the structure remained unchanged, i.e., for the Li and Na intercalation, whereas K intercalation, expectedly, could not be reconciled with this model.
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