Fabrication of NaNbO3-(Ca0.5Sr0.5)ZrO3 antiferroelectric thin film by pulsed laser deposition

Antiferroelectric 0.94NaNbO ₃ -0.06(Ca _0.5 Sr _0.5 )ZrO ₃ films on (001) and (110) SrTiO ₃ single crystal substrates were successfully fabricated by a pulsed laser deposition method. Partial substitution of NaNbO ₃ with (Ca _0.5 Sr _0.5 )ZrO ₃ stabilized antiferroelectric phase of NaNbO ₃ . Especially, two types of domains, which c-axis of antiferroelectric orthorhombic phase grew along with in-plane and out-of-plane direction, were observed in the 0.94NaNbO ₃ -0.06(Ca _0.5 Sr _0.5 )ZrO ₃ film on (001) SrTiO ₃ substrate. It was suggested that these two domains contribute the exhibition of superb antiferroelectricity in the film.