Foundations of High-Pressure Thermal Plasmas

An introduction to the main methods used to produce, model and measure thermal plasmas is provided, with emphasis on the differences between thermal plasmas and other types of processing plasmas. The critical properties of thermal plasmas are explained in physical terms and their importance in different applications is considered. The characteristics, and advantages and disadvantages, of the different main types of thermal plasmas (transferred and non-transferred arcs, radio-frequency inductively-coupled plasmas and microwave plasmas) are discussed. The methods by which flow is stabilized in arc plasmas are considered. The important concept of local thermodynamic equilibrium (LTE) is explained, leading into a discussion of the importance of thermophysical properties, and their calculation in LTE and two-temperature plasmas. The standard equations for modelling thermal plasmas are presented and contrasted with those used for non-equilibrium plasmas. Treatments of mixed-gas and non-LTE plasmas are considered, as well as the sheath regions adjacent to electrodes. Finally, the main methods used for electrical, optical, spectroscopic and laser diagnostics of thermal plasmas are briefly introduced, with an emphasis on the required assumptions for their reliable implementation, and the specific requirements of thermal plasmas.