Lv1
8 积分 2025-02-26 加入
Computational characterization of capacitive coupled HBr/Cl2/O2 plasma
1小时前
求助中
Selective Etching of SiO2 by Radical Recombination through NF3/H2 Pulsed RF Plasma
3小时前
已完结
Selective mask deposition using SiCl4 plasma for highly selective etching process
3小时前
已关闭
Comparisons of atomic layer etching of silicon in Cl2 and HBr-containing plasmas
4小时前
已完结
Limitations of the independent control of ion flux and energy distribution function in high-density inductively coupled chlorine plasmas
6小时前
已完结
皖公网安备34019202002308
