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Semiconductor Material and Device Characterization
3小时前
已完结
Kelvin Force Microscopy and corona charging for semiconductor material and device characterization
3小时前
求助中
Kelvin Force Microscopy and corona charging for semiconductor material and device characterization
4小时前
已完结
The Present Status and Recent Advancements in Corona-Kelvin Non-Contact Electrical Metrology of Dielectrics for IC-Manufacturing
4小时前
已完结
The effect of TEOS plasma parameters on the silicon dioxide deposition mechanisms
2个月前
已完结
Deposition kinetics of silicon dioxide from tetraethylorthosilicate by PECVD
2个月前
已完结
Effect of SiO2 intermediate layer on Al2O3/SiO2/n+-poly Si interface deposited using atomic layer deposition (ALD) for deep submicron device applications
3个月前
已完结
Low-temperature, high-growth-rate ALD of SiO2 using aminodisilane precursor
3个月前
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ALD of SiO[sub 2] at Room Temperature Using TEOS and H[sub 2]O with NH[sub 3] as the Catalyst
3个月前
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Trapped charge densities in Al2O3-based silicon surface passivation layers
3个月前
已完结
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