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40 积分 2024-03-11 加入
Fluorocarbon high density plasmas. VII. Investigation of selective SiO2-to-Si3N4 high density plasma etch processes
7天前
已完结
Difference between C4F8 and C5F8 plasmas in surface reaction processes for selective etching of SiO2 over Si3N4
8天前
已完结
Mechanism of selective Si3N4 etching over SiO2 in hydrogen-containing fluorocarbon plasma
8天前
已完结
Broadband and compact arbitrary ratio curved directional coupler enabled by inverse design
4个月前
已完结
Arbitrary-ratio 1 × 2 power splitter based on asymmetric multimode interference
4个月前
已完结
Compact and low-loss asymmetrical multimode interference splitter for power monitoring applications
4个月前
已完结
High speed optoelectronic response from the edges of lead zirconate titanate thin film capacitors
7个月前
已完结
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