Efficient Conversion of CO2 and CH4 Into Value Added Compounds Through Plasma Catalysis Process in a Dielectric Barrier Discharge Reactor

介质阻挡放电 催化作用 非热等离子体 等离子体 合成气 化学工程 产量(工程) 工艺工程 化学 温室气体 电介质 材料科学 有机化学 物理 工程类 光电子学 复合材料 生物 量子力学 生态学
作者
Danhua Mei,Gehui Duan,Shiyun Liu,Sen Wang,Zhi Fang
标识
DOI:10.1109/icops37625.2020.9717860
摘要

CO 2 reforming of CH4 has received great attention in the past three decades as it not only can provide a practical method for conversion of the two major greenhouse gases simultaneously for the production of value-added fuels and chemicals, but also is a promising approach to direct use of biogas, natural gas, coal bed gas and/or flared shale gas containing different amount of CO 2 and CH4. However, this process requires extreme reaction conditions with high temperatures to obtain reasonable yield of value-added chemicals, which leads to carbon deposition on the catalyst surface and therefore the deactivation of the catalyst. Non-thermal plasma has been investigated as an alternative method to the conventional chemical and/or catalytic processes. Among different non-thermal plasma techniques, dielectric barrier discharge (DBD) could be a suitable source for the plasma processes for CO 2 conversion, due to due to its simple design and up-scaling capability and its successful experience in ozone generation and gas cleaning on an industrial scale. In addition, catalysts can be easily integrated into a DBD reactor to generate a synergistic effect of plasma-catalysis, improving the selectivity of the desired products. In this work, plasma-catalytic CO 2 reforming of CH4 over different catalysts has been investigated in a coaxial DBD reactor at ambient conditions. The effect of the catalysts on the plasma reforming process is evaluated in terms of the conversion of CO 2 and CH 4 , the yield and selectivity of different products, the carbon deposition on the spent catalysts as well as the stability of catalyst during a long-time reaction. The energy efficiency of the plasma-catalytic reforming process is also discussed.
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